This filter from Mott, called the FLP Series, is ideal for filtering vapour phase low pressure dopants or organometallic precursor vapors such as TEMAZ, ZyALD™, PDMAT, TEOS, TiCl4, TEPO, TEB, POCl, Z4MS, Ztomcats, Trans-LC, TMB and others. With the demand for new low-k dielectric materials increasing as semiconductor line widths approach the 22 nm node, the challenge of filtering these low pressure, vapour phase dopants is now more critical.
The FLP Series is perfect for filtering dopants used in metalorganic vapour phase epitaxy (MOVPE) or Advanced CVD (chemical vapor deposition) and atomic layer deposition (ALD) applications. With its exceptionally low pressure drop and all metal construction, which can be heated to 450°C, the FLP Series provides protection against particle contamination in these extremely challenging conditions for pressure sensitive gas vapour systems.
The extremely open filter media allows for easy passage of the low pressure liquid source gas while having enough surface area to efficiently remove particles down to 0.003 µm and is especially effective at preventing large particle agglomerations from migrating downstream. These filters are all-metal and constructed from 316LSS. This allows them to withstand the higher temperatures needed to keep the low pressure gases and organometallics in the vapour phase.
Mott adds that the FLP Series currently consists of three standard configurations that make it easy to match to any existing heat jacketed filter installations.