Entegris launches ultra clean filter for semiconductor manufacturing

The series is its first commercial non-dewetting all-PTFE filter with 10 nm particle retention for advanced wet etch and clean applications.

"As the industry ramps to sub-2X nm manufacturing processes, enhanced cleanliness requirements have become a necessity to reduce particle defectivity and minimize metal contaminants that impact wafer yields," said Todd Edlund, senior vice president and general manager of Entegris' critical materials handling business. "Our new Torrento filter can enable integrated device manufactures to efficiently scale-up and produce more advanced devices."

Torrento X series filters can help with the 'drop-in replacement' of new or existing filters, enabling greater installation flexibility and reducing overall operational costs. The high-flux membrane filter comes standard with ultra-low metallic cleanliness technology (UCM) to minimize challenging contaminants in advanced semiconductor fabs. Entegris also offers an extreme-ultra clean membrane (X-UCM) option which reportedly has a higher level of cleanliness when compared to previous PTFE filter ranges. It also has faster start up times and better retention ratings.