This filter design is the only one available that meets the Semi requirements for 9 LRV (99.9999999% efficiency) down to 0.003 µm at the recommended flow rate. It was specifically developed to support the industry’s transition to 450 mm wafer equipment.As part of Mott’s Defender Series Filters, this filter can accommodate flow rates of 300 slpm in filter length of 3.31 inches (84 mm) or 650 slpm (127 mm) in lengths of 5.0 inches. This all-metal filter provides an extremely low pressure drop for the reduction of vacuum conductance allowing for fast wafer chamber evacuation and fill. With operating pressures up to 2,500 psig and operating temperatures up to 450°C, the Defender Series can support virtually every application in the semiconductor industry. Mott says that it is the first to offer an all-metal gas filter that can provide these efficiencies and these very high flow rates in such small footprints.
