Entegris has also expanded its CMP research, analytical services and manufacturing capabilities in Taiwan to meet growing demand for CMP filtration solutions in the semiconductor market.
Entegris adds that CMP processes continue to grow in complexity in both the materials used and the need for greater planarity in each layer of semiconductor devices. The company says that as its customers produce integrated circuits with smaller feature sizes, its nano-fibre technology reduces the number of defect-causing contaminants from reaching the wafer.
The Entegris filter platform using NMB media now includes the Planargard® bulk, Solaris® point-of-tool and Planarcap® point-of-dispense ranges to provide contamination control solutions throughout the CMP process area. The NMB media uses the increased porosity of the nano-fibres to reduce shear stress placed upon the slurry during transport and filtration operations. These innovations result in extended filter lifetime and greater removal of defect-causing contaminants.