Entegris Inc. has announced the availability of its Oktolex membrane technology for point-of-use photolithography applications.
The membranes aim to remove critical photochemical contaminants by enhancing the native retention mechanisms of each membrane type to match the needs of each chemistry.
By matching membrane characteristics with specific contaminant-adsorption mechanisms, Oktolex membranes can filter with no adverse interactions with the chemical composition. The technology is currently available in Entegris Impact 8G point-of-use photochemical filters.
