Pall Corporation announces the availability of its new 10 nm XpressKleen filter

The new 10 nm XpressKleen filter is designed to meet the growing defectivity challenges of sub-14 nm critical chemical processing. It demonstrates finer retention, 30% faster flow, and higher purity than previous filters. Retention is validated using Pall’s gold nanoparticle challenge test.

“The 10 nm XpressKleen filter leverages Pall’s proprietary ‘XP’ cleaning process that reduces trace metal contamination by 67% to less than 1 part per billion (ppb) total for 13 critical metal ions for a ten-inch device,” said Steve Chisolm, President of Pall Microelectronics. “The ‘XP’ cleaning process also removes organics, surface particles, and anions. Pall is proud to bring these important capabilities to the market.” Pall’s completely integrated manufacturing capability extends from PTFE resin to the finished filter device. The company’s advanced manufacturing process uses clean room manufacturing and improved statistical process control to ensure the reliability and performance of every 10 nm XpressKleen filter.

The new filter will be featured at SEMICON West in San Francisco.