The company is investing more than US$100 million for the first phase of the expansion, with subsequent investments planned over the course of construction.
The new facility, which will be located on a seven-acre campus that will include more than 18,000 sq m of manufacturing and office space, will mainly produce lithography and wet-etch filtration, purification and separation solutions that will help meet the high demand for advanced node solutions.
“The world is undergoing exponential growth in data generation, processing and storage due to increasing demands from wireless communications, the Internet of Things, automotive technology (autonomy, electrification and connectivity), cloud computing and artificial intelligence/deep learning,” explained Naresh Narasimhan, president of Pall Corp. “This facility will help support the rapid pace of innovation necessary for our customers to meet growing end market demand.”
Construction of the first phase will begin this summer and high-volume manufacturing capability will be completed between late 2023 and early 2024. Additional capacity will be added in subsequent years as the site undergoes a phased ramp to its full potential. When completed, the site will more than double Pall’s current installed capacity for manufacturing microelectronics filtration and purification solutions.
“With the construction of this new facility, we will bring a greater percentage of our manufacturing capacity closer to the manufacturing base of the majority of our customers, which will help reduce supply chain complexity and risk,” said Shangaza Dasent, vice president/general manager of Pall's Microelectronics business unit.
Pall plans to hire more than 300 employees with science, engineering and manufacturing experience to support the new site.