Memsift to build nickel recovery plant in Singapore for microelectronics effluent

Memsift Innovations Pte Ltd has received a new contract from a global microelectronics company to build a first of its kind nickel recovery plant in Singapore using its proprietary TS-30 Improved Membrane Distillation technology following successful pilot trials.

Initial case study samples- feed, permeate and the concentrate.
Initial case study samples- feed, permeate and the concentrate.

The microelectronics industry generates industrial effluent containing valuable metals such as nickel, which are typically lost during conventional wastewater treatment processes. Memsift’s Improved Membrane Distillation system recovers more than 95% of water and up to 100% nickel (estimated Nickel recovery: 10.2-ton/year and the carbon footprint of nickel is 11.5kg/kg) from the microelectronics industrial effluents.

The Memsift system is designed to achieve high efficiency in nickel recovery while minimizing energy consumption and operating costs by up to 80% compared to the current method in place. Memsift says it helps to reduce emissions by about 211-ton CO2/year compared to the current business-as-usual scenario, with about 43% of the reduction due to the direct energy savings. Typically, it requires about 8436 trees to absorb the same amount of CO2 from the atmosphere over a one year period.

"As a company committed to sustainability and innovation, we are thrilled to have been awarded this new contract,” said Dr J Antony Prince, founder & CEO of Memsift Innovations. “The company remains dedicated to exploring and implementing new solutions to help our clients from the high value manufacturing industries to meet their sustainability goals.”

Pilot scale TS-30 Improved Membrane Distillation system that has been tested and validated in the field.