- 14 August 2006 -

New Pall filters for semiconductor market

Pall has launched UltiKleenExcellar and the Ultipleat SP, two new membrane technology platforms for single wafer and batch wet chemical processing for semiconductors.

The UltiKleenExcellar ER Filter is the first 20-nanometer rated, all-fluoropolymer filter with a PTFE membrane design with improved surface kinetics for greater non-dewetting in aqueous and high viscosity chemicals.

The Ultipleat SP DR Filter is a 30-nanometer rated highly asymmetric membrane filter developed for wet chemical surface preparation applications. The filter's unique asymmetric design allows for dual retention, and its polymer material enables the filter to operate at higher temperatures than other polymers. The filter also features improved chemical resistance, a hydrophilic surface and high flow rates, Pall says.

www.pall.com